Easy To Use Patents Search & Patent Lawyer Directory

At Patents you can conduct a Patent Search, File a Patent Application, find a Patent Attorney, or search available technology through our Patent Exchange. Patents are available using simple keyword or date criteria. If you are looking to hire a patent attorney, you've come to the right place. Protect your idea and hire a patent lawyer.

Searching:





Search by keyword, patent number, inventor, assignee, city or state:




Patent # Description
2019/0067035 SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
A method for manufacturing a semiconductor device and a semiconductor device produced thereby. For example and without limitation, various aspects of this...
2019/0067034 HYBRID ADDITIVE STRUCTURE STACKABLE MEMORY DIE USING WIRE BOND
Semiconductor devices with redistribution structures that do not include pre-formed substrates and associated systems and methods are disclosed herein. In one...
2019/0067033 Surface Mount Semiconductor Device and Method of Manufacture
A surface mount semiconductor device and method of manufacture. A semiconductor die is mounted on a first support surface; a leadframe is attached to the...
2019/0067032 ETCHING METHOD AND ETCHING APPARATUS
In an etching method of etching a tungsten film, the method is provided to execute a generating a surface reaction layer on a tungsten film that is formed on a...
2019/0067031 ETCHING METHOD AND ETCHING APPARATUS
An etching method includes loading, first and second supplying, removing and etching steps. In the loading step, a target object is loaded into a chamber. In...
2019/0067030 ETCHING METHOD AND ETCHING PROCESSING APPARATUS
A method of etching silicon-containing film formed on an electrode layer of a floating potential is provided. The etching is performed in a processing vessel...
2019/0067029 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE
An interlayer insulating film is dry etched using a CHF.sub.3 gas and by using, as a mask, a resist film having a first opening and a second opening that is...
2019/0067028 VAPOR-ETCH CYCLIC PROCESS
Various embodiments comprise methods of selectively etching oxides over nitrides in a vapor-etch cyclic process. In one embodiment, the method includes, in a...
2019/0067027 Fin Field-Effect Transistor Device And Method
A method includes forming a semiconductor capping layer over a first fin in a first region of a substrate, forming a dielectric layer over the semiconductor...
2019/0067026 SEMICONDUCTOR MANUFACTURING DEVICE AND METHOD OF POLISHING SEMICONDUCTOR SUBSTRATE
There is provided a semiconductor manufacturing device including: a polishing head that is capable of retaining a semiconductor substrate; a polishing pad...
2019/0067025 THREE-DIMENSIONAL MEMORY DEVICE WITH STRADDLING DRAIN SELECT ELECTRODE LINES AND METHOD OF MAKING THEREOF
An alternating stack of insulating layers and spacer material layers is formed over a substrate. The spacer material layers are formed as, or are replaced...
2019/0067024 UTILIZING MULTIPLE LAYERS TO INCREASE SPATIAL FREQUENCY
A chemical material is deposited on a surface of a substrate. A mandrel composition is deposited on a surface of the chemical material. A mandrel hard mask...
2019/0067023 UTILIZING MULTIPLE LAYERS TO INCREASE SPATIAL FREQUENCY
A chemical material is deposited on a surface of a substrate. A mandrel composition is deposited on a surface of the chemical material. A mandrel hard mask...
2019/0067022 Reduction of Line Wiggling
A method for reducing wiggling in a line includes forming a silicon patterning layer over a substrate and depositing a mask layer over the silicon patterning...
2019/0067021 COMPOSITION FOR FORMING ORGANIC FILM, SUBSTRATE FOR MANUFACTURING SEMICONDUCTOR APPARATUS, METHOD FOR FORMING...
The invention provides a composition for forming an organic film, which generates no by-product even under such a film formation condition in an inert gas to...
2019/0067020 Fin Patterning for Semiconductor Devices
A method of forming a semiconductor device is disclosed. The method includes providing a device having a substrate and a hard mask layer over the substrate;...
2019/0067019 WORKPIECE PROCESSING METHOD
An embodiment of the present disclosure provides a method of processing a workpiece in which a plurality of holes are formed on a surface of the workpiece. The...
2019/0067018 GRINDING APPARATUS
A grinding apparatus includes a table that holds a workpiece, and a grinding unit including a grinding wheel mounted to a spindle. The grinding wheel has a...
2019/0067017 ETCHING AND MECHANICAL GRINDING FILM-LAYERS STACKED ON A SEMICONDUCTOR SUBSTRATE
In some embodiments, a method includes wet-etching a first film layer of a plurality of film layers stacked on a semiconductor substrate, the wet-etching of...
2019/0067016 LAYER FORMING METHOD
There is provided a method of forming a layer, comprising depositing a seed layer on the substrate and depositing a bulk layer on the seed layer. Depositing...
2019/0067015 Film-Forming Method and Film-Forming Apparatus
There is provided a film-forming method, including: a pre-coating process of supplying a first gas containing silicon into a processing container in which a...
2019/0067014 METHODS FOR FILLING A GAP FEATURE ON A SUBSTRATE SURFACE AND RELATED SEMICONDUCTOR DEVICE STRUCTURES
Methods for filling a gap feature on a substrate surface are disclosure. The methods may include: providing a substrate comprising one or more gap features...
2019/0067013 Wrap-Around Contact Plug and Method Manufacturing Same
A method includes forming a source/drain region, and in a vacuum chamber or a vacuum cluster system, preforming a selective deposition to form a metal silicide...
2019/0067012 METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE
A method for forming a semiconductor device structure is provided. The method includes providing a semiconductor substrate, a gate structure, a first doped...
2019/0067011 FinFET Device and Methods of Forming Same
A FinFET device and method of forming the same are disclosed. The method includes forming a gate dielectric layer and depositing a metal oxide layer over the...
2019/0067010 MULTIPLE PATTERNING WITH VARIABLE SPACE MANDREL CUTS
Methods of multiple patterning. First and second mandrel lines are formed on a patternable layer. Sidewall spacers are formed on the patternable layer adjacent...
2019/0067009 WORKPIECE PROCESSING METHOD
Based on the fact that a film thickness of a film formed in a film formation processing of repeatedly performing a first sequence varies according to a...
2019/0067008 SEMICONDUCTOR STRUCTURES AND FABRICATION METHODS THEREOF
A method for fabricating a semiconductor structure includes providing a base substrate; forming a first mask layer to cover a portion of the base substrate;...
2019/0067007 REFLECTION MODE PHOTOMASK AND FABRICATION METHOD THEREFORE
A method of fabricating a mask blank includes depositing a reflective multilayer over a substrate, depositing a capping layer over the reflective multilayer,...
2019/0067006 EPITAXY SYSTEM INTEGRATED WITH HIGH SELECTIVITY OXIDE REMOVAL AND HIGH TEMPERATURE CONTAMINANT REMOVAL
In one implementation, a processing system includes a first transfer chamber coupling to at least one epitaxy process chamber, a second transfer chamber, a...
2019/0067005 METHOD FOR FABRICATING METAL CHALCOGENIDE THIN FILMS
Provided is a method for fabricating high-uniformity and high-quality metal chalcogenide thin films. The method for fabricating metal chalcogenide thin films...
2019/0067004 METHODS FOR DEPOSITING A DOPED GERMANIUM TIN SEMICONDUCTOR AND RELATED SEMICONDUCTOR DEVICE STRUCTURES
A method for depositing a germanium tin (Ge.sub.1-xSn.sub.x) semiconductor is disclosed. The method may include; providing a substrate within a reaction...
2019/0067003 METHODS FOR DEPOSITING A MOLYBDENUM METAL FILM ON A DIELECTRIC SURFACE OF A SUBSTRATE AND RELATED SEMICONDUCTOR...
Methods for depositing a molybdenum metal film directly on a dielectric material surface of a substrate by a cyclical deposition process are disclosed. The...
2019/0067002 METHOD FOR MANUFACTURING A SEMICONDUCTOR DEVICE
In a method of manufacturing a semiconductor device, a photo resist layer is formed over a substrate with underlying structures. The first photo resist layer...
2019/0067001 MASK ASSEMBLY AND METHOD FOR FABRICATING A CHIP PACKAGE
A first mask and a second mask are sequentially provided to perform a multi-step exposure and development processes. Through proper overlay design of the first...
2019/0067000 Pattern Fidelity Enhancement
The present disclosure provides a method for semiconductor manufacturing in accordance with some embodiments. The method includes providing a substrate and a...
2019/0066999 METHOD FOR CLEANING SEMICONDUCTOR WAFER
A method for cleaning a semiconductor wafer by using a chemical tank containing an SC-2 solution including, a plurality of the chemical tanks are used, and...
2019/0066998 INTEGRATED EPITAXY AND PRECLEAN SYSTEM
Implementations of the present disclosure generally relates to a transfer chamber coupled to at least one vapor phase epitaxy chamber a plasma oxide removal...
2019/0066997 LAYER FORMING METHOD AND APPARATUS
There is provided a method and apparatus for forming a layer, by sequentially repeating a layer deposition cycle to process a substrate disposed in a reaction...
2019/0066996 LOW-PRESSURE ULTRAVIOLET RADIATOR WITH MULTIPLE FILAMENTS
A low pressure mercury gas discharge ultraviolet lamp with a tubular elongate body with two opposing ends, a first end and a second end, which contains a gas...
2019/0066995 INTEGRATED SAMPLE PROCESSING FOR ELECTROSPRAY IONIZATION DEVICES
Methods, systems and devices that generate differential axial transport in a fluidic device having at least one fluidic sample separation flow channel and at...
2019/0066994 APPARATUS AND METHOD FOR SAMPLING
In various embodiments of the invention, a cargo container can be monitored at appropriate time intervals to determine that no controlled substances have been...
2019/0066993 ION TRAPS WITH Y-DIRECTIONAL ION MANIPULATION FOR MASS SPECTROMETRY AND RELATED MASS SPECTROMETRY SYSTEMS AND...
A miniature electrode apparatus is disclosed for trapping charged particles, the apparatus includes, along a longitudinal direction, a first end cap electrode,...
2019/0066992 METHOD FOR ANALYZING OPTICAL ISOMERS AND ION MOBILITY ANALYZER
The existence ratio of optical isomers (D-form, L-form) is easily measured. Counterclockwise or clockwise circularly polarized light is applied from a light...
2019/0066991 SYSTEMS AND METHODS FOR SAMPLE ANALYSIS USING SWABS
The invention generally relates to systems and methods for sample analysis using swabs. In certain aspects, the invention provides systems that include a probe...
2019/0066990 VACUUM PROCESSING DEVICE AND MASS ANALYZING DEVICE
A vacuum processing apparatus 100 includes: a vacuum chamber 1; a stage 2 placed inside the vacuum chamber 1, on which an object to be processed is placed; an...
2019/0066989 PRECURSOR AND NEUTRAL LOSS SCAN IN AN ION TRAP
The invention generally relates to systems and methods for precursor and neutral loss scan in an ion trap. In certain aspects, the invention provides a system...
2019/0066988 SPUTTER TARGET MAGNET
A method for modifying magnetic field distribution in a deposition chamber is disclosed. The method includes the steps of providing a target magnetic field...
2019/0066987 SPUTTERING TARGETS AND DEVICES INCLUDING Mo, Nb, and Ta, AND METHODS
Sputtering targets including molybdenum, niobium and tantalum are found to be useful for sputtering films for electronic devices. Sputtering targets with about...
2019/0066986 DETERMINING SUSCEPTOR SERVICE LIFE IN A PLASMA PROCESSING CHAMBER
In one embodiment of the invention, a method for predicting a susceptor's service life in a processing chamber is disclosed. The method begins by creating...
← Previous | 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 89 90 91 92 93 94 95 96 97 98 99 100 101 102 103 104 105 106 107 108 109 110 111 112 113 114 115 116 117 118 119 120 121 122 123 124 125 126 127 128 129 130 131 132 133 134 135 136 137 138 139 140 141 142 143 144 145 146 147 148 149 150 151 152 153 154 155 156 157 158 159 160 161 162 163 164 165 166 167 168 169 170 171 172 173 174 175 176 177 178 179 180 181 182 183 184 185 186 187 188 189 190 191 192 193 194 195 196 197 198 199 200 | Next →

File A Patent Application

  • Protect your idea -- Don't let someone else file first. Learn more.

  • 3 Easy Steps -- Complete Form, application Review, and File. See our process.

  • Attorney Review -- Have your application reviewed by a Patent Attorney. See what's included.