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Patent # Description
2019/0088481 CHIP HANDLING AND ELECTRONIC COMPONENT INTEGRATION
Small size chip handling and electronic component integration are accomplished using handle fixturing to transfer die or other electronic components from a...
2019/0088480 CHIP HANDLING AND ELECTRONIC COMPONENT INTEGRATION
Small size chip handling and electronic component integration are accomplished using handle fixturing to transfer die or other electronic components from a...
2019/0088479 SYSTEMS AND METHOD FOR CHARGE BALANCED SEMICONDUCTOR POWER DEVICES WITH FAST SWITCHING CAPABILITY
A method of manufacturing a semiconductor device including performing a first implantation in a semiconductor layer via ion implantation forming a first...
2019/0088478 METHODS FOR FORMING FINS
The disclosure is directed to methods for forming a set of fins from a substrate. One embodiment of the disclosure includes: providing a stack over the...
2019/0088477 SEMICONDUCTOR STACK
A semiconductor stack includes a substrate made of silicon carbide, and an epi layer disposed on the substrate and made of silicon carbide. An epi principal...
2019/0088476 BUFFER LAYERS HAVING COMPOSITE STRUCTURES
Disclosed is a wafer or a material stack for semiconductor-based optoelectronic or electronic devices that minimizes or reduces misfit dislocation, as well as...
2019/0088475 FILM FORMING METHOD
Disclosed is a film forming method including forming a metal oxide film on a base film by alternately supplying a metal-containing gas and a plasmatized...
2019/0088474 Silyl Substituted Organoamines as Precursors for High Growth Rate Silicon-Containing Films
Described herein are novel silyl-substituted hydrazine and silyl-substituted diamine precursor compounds and compositions and methods comprising same to...
2019/0088473 LITHOGRAPHIC PRINTING PLATE PRECURSOR, METHOD OF PRODUCING LITHOGRAPHIC PRINTING PLATE, AND LITHOGRAPHIC...
A lithographic printing plate precursor including an image recording layer containing an infrared absorber represented by Formula I, on a support, and a method...
2019/0088472 METHODS OF FORMING SEMICONDUCTOR DEVICE STRUCTURES
A method of forming a semiconductor device structure comprises forming a preliminary structure comprising a substrate, a photoresist material over the...
2019/0088471 USING CUMULATIVE HEAT AMOUNT DATA TO QUALIFY HOT PLATE USED FOR POSTEXPOSURE BAKING
A test wafer is placed inside a baking module and is baked. Via one or more temperature sensors, a cumulative heat amount delivered to the test wafer during...
2019/0088470 FILL MATERIAL TO MITIGATE PATTERN COLLAPSE
A method for preventing the collapse of patterned, high aspect ratio features formed in semiconductor substrates upon removal of an initial fluid of the type...
2019/0088469 METHOD OF PROCESSING SUBSTRATE AND SUBSTRATE PROCESSING APPARATUS
A liquid of a hydrophobizing agent is supplied to a surface of a substrate to form a liquid film of the hydrophobizing agent that covers the entire surface...
2019/0088468 SEMICONDUCTOR WAFER CLEANING APPARATUS
A semiconductor wafer cleaning apparatus is provided. The semiconductor wafer cleaning apparatus includes a spin base having a through hole. The semiconductor...
2019/0088467 HIGH-K DIELECTRIC LAYER, FABRICATING METHOD THEREOF AND MULTI-FUNCTION EQUIPMENT IMPLEMENTING SUCH FABRICATING...
The invention discloses a high-k dielectric layer, a fabricating method thereof and a multi-function equipment implementing such fabricating method. The high-k...
2019/0088466 METHODS OF FORMING SOI SUBSTRATES
Methods of forming SOI substrates are disclosed. In some embodiments, an epitaxial layer and an oxide layer are formed on a sacrificial substrate. An etch stop...
2019/0088465 METHOD FOR PRODUCING SILICON NITRIDE FILM AND SILICON NITRIDE FILM
One object of the present invention is to provide a method for producing a silicon nitride film having a high hydrofluoric acid resistance, a high moisture...
2019/0088464 THERMALLY REMOVABLE FILL MATERIALS FOR ANTI-STICTION APPLICATIONS
A method for preventing the collapse of patterned, high aspect ratio features formed in semiconductor substrates upon removal of wash solutions of the type...
2019/0088463 WAFER LEVEL SEQUENCING FLOW CELL FABRICATION
A method for forming sequencing flow cells can include providing a semiconductor wafer covered with a dielectric layer, and forming a patterned layer on the...
2019/0088462 METHOD FOR MANUFACTURING A SUBSTRATE
A method for manufacturing a substrate includes the following steps: (a) providing a support substrate with a first coefficient of thermal expansion, having on...
2019/0088461 MASS SPECTROMETRY APPARATUS AND MASS SPECTROMETRY METHOD
According to an embodiment, a mass spectrometry apparatus includes a beam irradiator, a laser irradiator, a mass spectrometer and a controller. The beam...
2019/0088460 VOLTAGE APPLICATION METHOD, VOLTAGE APPLICATION DEVICE, AND TIME-OF-FLIGHT MASS SPECTROMETER
Voltages are applied by a voltage application device having an electrode circuit including a plurality of electrode connection parts connected in series via a...
2019/0088459 ANALYSIS METHOD AND ANALYTICAL DEVICE
An analysis method includes: converting a first ion derived from a sample component into a radical to generate a second ion; reacting the second ion or an ion...
2019/0088458 AUTOMATIC CALIBRATION DEVICE AND ION MIGRATION SPECTROMETER
Embodiments of the present disclosure provide an automatic calibration device for an ion migration spectrometer and an ion migration spectrometer. The...
2019/0088457 SYNC CONTROLLER FOR HIGH IMPULSE MAGNETRON SPUTTERING
Embodiments presented herein relate to a method of and apparatus for processing a substrate in a semiconductor processing system. The method begins by...
2019/0088456 Physical Vapor Deposition Chamber With Static Magnet Assembly And Methods Of Sputtering
Magnetrons for plasma sputter chambers, plasma sputter chambers including magnetrons and methods of processing a substrate such as an EUV mask blank in a...
2019/0088455 PLASMA PROCESSING APPARATUS AND PREDICTION METHOD OF THE CONDITION OF PLASMA PROCESSING APPARATUS
A system that predicts an apparatus state of a plasma processing apparatus including a processing chamber in which a sample is processed is configured to have...
2019/0088454 PLASMA PROCESSING APPARATUS
A plasma processing apparatus includes a processing vessel, an upper structure that is provided on an upper portion of the processing vessel and generates...
2019/0088453 PLASMA PROCESSING APPARATUS
A plasma processing apparatus includes a processing chamber, a radio frequency power source, and a magnetic-field generation unit. In the processing chamber, a...
2019/0088452 PLASMA PROCESSING APPARATUS AND PLASMA PROCESSING METHOD
According to one embodiment, a plasma processing apparatus includes a processing chamber, a sample stage that is disposed inside the processing chamber and...
2019/0088451 Integrated Thermal Management for Surface Treatment with Atmospheric Plasma
Methods and systems for thermal management methods to control the rates of chemical reaction at the surface of a substrate being treated by atmospheric plasma....
2019/0088450 BEAM INTENSITY CONVERTING FILM, AND METHOD OF MANUFACTURING BEAM INTENSITY CONVERTING FILM
Provided is a beam intensity converting film that has sufficient shielding property, sufficient durability, and sufficient heat resistance and that can reduce...
2019/0088449 SUBSTRATE TREATING APPARATUS AND SUBSTRATE TREATING METHOD
Disclosed is a substrate treating apparatus. The substrate treating apparatus includes a process chamber having a treatment space in the interior thereof, a...
2019/0088448 Method for Irradiating a Target Using Restricted Placement Grids
A method for irradiating a target with a beam of energetic electrically charged particles, wherein the target comprises an exposure region where an exposure by...
2019/0088446 MINIATURE ELECTRON BEAM LENS ARRAY USE AS COMMON PLATFORM EBEAM WAFER METROLOGY, IMAGING AND MATERIAL ANALYSIS...
An apparatus includes at least one electron beam column, with an electron emitter source, a gun lens focusing electrons from the electron emitter source into...
2019/0088445 Unknown
A device with an ion column and a scanning electron microscope comprises at least one column detector of signal electrons placed inside or on the ion column....
2019/0088444 EVALUATING AN OBJECT
A method for evaluating an object, the method may include acquiring, by a charged particle beam system, an image of an area of a reference object, wherein the...
2019/0088443 RF RESONATOR FOR ION BEAM ACCELERATION
An RF feedthrough has an electrically insulative cone that is hollow having first and second openings at first and second ends having first and second...
2019/0088442 Electron-Beam Inspection Systems with optimized throughput
Techniques for yield management in semiconductor inspection systems are described. According to one aspect of the present invention, columns of sensing...
2019/0088441 ELECTRON EMISSION TUBE, ELECTRON IRRADIATION DEVICE, AND METHOD OF MANUFACTURING ELECTRON EMISSION TUBE
An electron emission tube includes a housing in which an internal space is provided and which keeps the internal space in vacuum, an electron source that is...
2019/0088440 PARTICLE BEAM SYSTEM
Particle beam system comprising a particle source; a first multi-aperture plate with a multiplicity of openings downstream of which particle beams are formed;...
2019/0088439 X-RAY CT APPARATUS AND INSERT
An X-ray CT apparatus according to an embodiment includes: a rotatable gantry base; a housing that is fixed to the gantry base and that has an opening; an...
2019/0088438 X-RAY ILLUMINATION SYSTEM WITH MULTIPLE TARGET MICROSTRUCTURES
An x-ray illumination beam system includes an electron emitter and a target having one or more target microstructures. The one or more microstructures may be...
2019/0088437 CARBON NANOTUBE ELECTRON EMITTER, METHOD OF MANUFACTURING THE SAME AND X-RAY SOURCE USING THE SAME
The present disclosure provides a method of manufacturing a carbon nanotube electron emitter, including: forming a carbon nanotube film; performing...
2019/0088436 HIGH CURRENT ONE-PIECE FUSE ELEMENT AND SPLIT BODY
A compact, high breaking capacity fuse that includes a top and bottom insulative layer and a single piece fusible element disposed between the top and bottom...
2019/0088435 MEMS MEMBRANE WITH INTEGRATED TRANSMISSION LINE
A micro-electromechanical-system (MEMS) switch (1) is formed in a substrate (2) and includes a first RF signal line (3) and a second RF signal line (4), a...
2019/0088434 ULTRAFAST ELECTROMECHANICAL DISCONNECT SWITCH HAVING ELLIPTICAL SHELL SURROUNDED ACTUATOR
An ultrafast electromechanical switch having a drive mechanism comprising three non-movable contacts, an actuator, two movable contacts and a first and second...
2019/0088433 ULTRAFAST ELECTROMECHANICAL DISCONNECT SWITCH HAVING CONTACT PRESSURE ADJUSTMENT AND SWITCHING CHAMBER
An ultrafast electromechanical switch having a drive mechanism comprising three non-movable contacts, an actuator and two movable contacts. The switch further...
2019/0088432 CONTACT DEVICE
A contact device includes a main contact mechanism including a pair of main fixed contacts and a main movable contact elastically supported by a movable shaft...
2019/0088431 ELECTROMAGNETIC RELAY DEVICE AND CONTROL METHOD THEREOF
The present disclosure illustrates an electromagnetic relay device and a control method thereof. In the electromagnetic relay device, a control circuit...
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