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Patent # Description
2019/0096694 METHODS FOR HIGH PRECISION PLASMA ETCHING OF SUBSTRATES
A plasma processing system and methods for high precision etching of microelectronic substrates. The system may include a combination of microwave and radio...
2019/0096693 METHOD FOR FORMING SEMICONDUCTOR DEVICE STRUCTURE
A method for forming a semiconductor device structure is provided. The method includes forming a first layer over a substrate. The method includes forming a...
2019/0096692 SEMICONDUCTOR STRUCTURE AND FABRICATION METHOD THEREOF
A semiconductor structure and a method for fabricating the semiconductor structure are provided. The method includes providing a substrate including a device...
2019/0096691 Heat Shield for Chamber Door and Devices Manufactured Using Same
A chamber door, such as an etch chamber door may be heated during etch processing to, e.g., prevent etching by-products from adhering to the etch chamber door....
2019/0096690 ATOMIC LAYER ETCHING OF METAL OXIDE
A method for etching a metal oxide layer on a semiconductor substrate, comprising providing a plurality of cycles, is provided. Each cycle comprises exposing...
2019/0096689 PLASMA ETCHING METHOD
A plasma etching method includes: a deposition step of providing an atmosphere containing a first processing gas including at least one gas including either or...
2019/0096688 SUBSTRATE PROCESSING APPARATUS AND SUBSTRATE PROCESSING METHOD
A substrate processing apparatus includes: a substrate holder to hold a substrate in a horizontal posture while rotating the substrate about a vertical rotary...
2019/0096687 ETCHING APPARATUS AND ETCHING METHOD
According to one embodiment, an etching apparatus for etching a semiconductor with an aid of a noble metal catalyst, includes a reaction vessel configured to...
2019/0096686 METHOD FOR FORMING MULTI-LAYER MASK
A method includes forming a spin-on carbon (SOC) layer over a target structure; chemically treating an upper portion of the SOC layer; forming a sacrificial...
2019/0096685 SELF-ALIGNED BUILD-UP OF TOPOGRAPHIC FEATURES
Methods and architectures for self-aligned build-up of patterned features. An initial patterned feature aspect ratio may be maintained or increased, for...
2019/0096684 POLARIZATION-DEPENDENT LASER-ASSISTED PLASMA ETCHING
A method of laser-assisted plasma etching with polarized light comprises providing a surface of a substrate that includes at least one surface region having...
2019/0096683 SEMICONDUCTOR MEMORY DEVICE
A semiconductor memory device including a first semiconductor layer, first gate electrodes, a first gate insulating layer and a laminated film. The first...
2019/0096682 METHOD OF FABRICATING GATE OXIDE OF SEMICONDUCTOR DEVICE
A method of fabricating a semiconductor device includes forming a semiconductor fin comprising a channel region for a fin field effect transistor (finFET). A...
2019/0096681 Gate Structure Passivating Species Drive-In Method and Structure Formed Thereby
Generally, the present disclosure provides example embodiments relating to formation of a gate structure of a device, such as in a replacement gate process,...
2019/0096680 GATE STRUCTURE PASSIVATING SPECIES DRIVE-IN METHOD AND STRUCTURE FORMED THEREBY
Generally, the present disclosure provides example embodiments relating to formation of a gate structure of a device, such as in a replacement gate process,...
2019/0096679 GATE STACK PROCESSES AND STRUCTURES
Structures for a field-effect transistor and methods for forming a structure for a field-effect transistor. A gate cavity is formed in a dielectric layer that...
2019/0096678 Semiconductor Device and Methods of Manufacture
A semiconductor device and method of manufacture are provided. In an embodiment a metal layer is formed over a substrate using a fluorine-free deposition...
2019/0096677 METHODS OF FORMING A GATE CONTACT STRUCTURE FOR A TRANSISTOR
One illustrative method disclosed includes selectively forming sacrificial conductive source/drain cap structures on and in contact with first and second...
2019/0096676 WAFER PROCESSING METHOD
A processing method for performing laser processing on a wafer includes: a reflected light detecting step of irradiating the wafer with light for state...
2019/0096675 METHOD FOR FORMING SEMICONDUCTOR STRUCTURE
A method for forming a semiconductor device structure is provided. The method includes forming a material layer over a substrate and forming a resist layer...
2019/0096674 Doping Through Diffusion and Epitaxy Profile Shaping
A method includes etching a semiconductor substrate to form a first trench and a second trench. A remaining portion of the semiconductor substrate is left...
2019/0096673 APPARATUS FOR FORMING A LAYER ON A SUBSTRATE AND METHOD OF FORMING AN AMORPHOUS SILICON LAYER ON A SUBSTRATE...
Disclosed are an apparatus for forming a layer and a method of forming the layer using the same. The apparatus includes a transfer chamber in which a substrate...
2019/0096672 Systems and Methods for Patterning Features in Tantalum Nitride (TaN) Layer
Embodiments of systems and methods for patterning features in tantalum nitride (TaN) are described. In an embodiment, a method may include receiving a...
2019/0096671 METHOD OF PRODUCING AN ELEMENT OF A MICROELECTRONIC DEVICE
The present invention relates to a method for producing an element of a microelectronic device on a support comprising a base layer, an inserted layer and a...
2019/0096670 METHOD FOR MANUFACTURING LOW-TEMPERATURE POLY-SILICON THIN FILM TRANSISTOR
Disclosed is a method for manufacturing a low-temperature poly-silicon thin film transistor, which relates to the technical field of display panel. The method...
2019/0096669 SILICON RESIDUE REMOVAL IN NANOSHEET TRANSISTORS
A method for forming a nanosheet semiconductor device includes forming a nanosheet stack comprising channel nanosheets. The method includes depositing silicon...
2019/0096668 SEED CRYSTAL FOR GROWTH OF GALLIUM NITRIDE BULK CRYSTAL IN SUPERCRITICAL AMMONIA AND FABRICATION METHOD
In one instance, the seed crystal of this invention provides a nitrogen-polar c-plane surface of a GaN layer supported by a metallic plate. The coefficient of...
2019/0096667 SEED CRYSTAL FOR GROWTH OF GALLIUM NITRIDE BULK CRYSTAL IN SUPERCRITICAL AMMONIA AND FABRICATION METHOD.,/
In one instance, the seed crystal of this invention provides a nitrogen-polar c-plane surface of a GaN layer supported by a metallic plate. The coefficient of...
2019/0096666 Use of Selective Aluminum Oxide Etch
Methods of forming and processing semiconductor devices which utilize the selective etching of aluminum oxide over silicon oxide and/or silicon nitride are...
2019/0096665 METHOD AND SYSTEM FOR SUPPLYING CHEMICAL LIQUID IN SEMICONDUCTOR FABRICATION
A method for dispensing photoresist over a semiconductor wafer is provided. The method includes moving a dispensing nozzle to a predetermined position where...
2019/0096664 METHOD OF FORMING SILICON-CONTAINING FILM
A method of forming a silicon-containing film includes: an adsorption step of supplying a silicon-containing gas represented by a general formula XSiCl.sub.3...
2019/0096663 METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE, NON-TRANSITORY COMPUTER-READABLE RECORDING MEDIUM, AND SUBSTRATE...
A method for improving a film formation rate and forming a film having a high dry etching resistance is disclosed. The method includes forming a metal nitride...
2019/0096662 METHOD OF FABRICATING INTEGRATED CIRCUIT DEVICES
Provided is a method of fabricating an integrated circuit device, the method including: forming, on a substrate, a developable bottom anti-reflective coating...
2019/0096661 Post-CMP Cleaning and Apparatus for Performing the Same
A method of performing a post Chemical Mechanical Polish (CMP) cleaning includes picking up the wafer, spinning a cleaning solution contained in a cleaning...
2019/0096660 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE, SUBSTRATE PROCESSING APPARATUS, AND RECORDING MEDIUM
There is provided a method of forming a film with improved step coverage on a substrate by performing, a predetermined number of times, forming a first layer...
2019/0096659 SYSTEMS AND METHODS FOR WAFER MAP ANALYSIS
A system for reconstructing wafer maps of semiconductor wafers includes: a processor; and memory having instructions stored thereon that, when executed by the...
2019/0096658 MASK PATTERN FORMING METHOD, FINE PATTERN FORMING METHOD, AND FILM DEPOSITION APPARATUS
In a mask pattern forming method, a resist film is formed over a thin film, the resist film is processed into resist patterns having a predetermined pitch by...
2019/0096657 SIMPLIFIED LAMP DESIGN
Embodiments of the present invention generally relate to simplified, high voltage, tungsten halogen lamps for use as source of heat radiation in a rapid...
2019/0096656 ELECTRODELESS LAMP SYSTEM AND METHODS OF OPERATION
An embodiment of a system includes an RF signal source, a first electrode, a second electrode, and a cavity configured to receive an electrodeless bulb. The RF...
2019/0096655 MINIATURE CHARGED PARTICLE TRAP WITH ELONGATED TRAPPING REGION FOR MASS SPECTROMETRY
A miniature electrode apparatus is disclosed for trapping charged particles, the apparatus including, along a longitudinal direction: a first end cap...
2019/0096654 ION PROFILING WITH A SCANNING QUADRUPOLE MASS FILTER
A mass spectrometer is disclosed comprising an ion mobility separation device for separating ions according to their ion mobility, a first quadrupole mass...
2019/0096653 SYSTEM AND METHODOLOGY FOR EXPRESSING ION PATH IN A TIME-OF-FLIGHT MASS SPECTROMETER
A system for expressing an ion path in a time-of-flight (TOF) mass spectrometer. The present invention uses two successive curved sectors, with the second one...
2019/0096652 MASS SPECTROMETRIC METHOD AND MALDI-TOF MASS SPECTROMETER
A number of standard methods exist for normalizing MALDI-TOF data, but they are not able to compensate adequately for the observed technical variability. The...
2019/0096651 WIDE-RANGE HIGH MASS RESOLUTION IN REFLECTOR TIME-OF-FLIGHT MASS SPECTROMETERS
The invention relates to the operation of an energy-focusing and solid-angle-focusing reflector for time-of-flight mass spectrometers with pulsed ion...
2019/0096650 METHOD FOR EVALUATING THE QUALITY OF MASS SPECTROMETRIC IMAGING PREPARATIONS AND KIT-OF-PARTS THEREFOR
The invention relates to a method for evaluating a quality of preparations of analytical tissue sections for mass spectrometric imaging using a reference...
2019/0096649 SYSTEM AND METHOD FOR IONIZATION OF MOLECULES FOR MASS SPECTROMETRY AND ION MOBILITY SPECTROMETRY
An ionizing system includes a channel and a heater coupled to the channel. The channel has an inlet disposed in a first pressure region having a first pressure...
2019/0096648 METHOD FOR MONITORING THE QUALITY OF MASS SPECTROMETRIC IMAGING PREPARATION WORKFLOWS
The invention relates to a method for monitoring a quality of preparation workflows of analytical tissue sections for mass spectrometric imaging using a...
2019/0096647 Systems and Methods for Identifying Compounds from MS/MS Data without Precursor Ion Information
Systems and methods are provided for identifying a precursor ion without using any a priori precursor ion information. In one method, a sample is analyzed...
2019/0096646 Mass Spectrometry Data Processing Apparatus, Mass Spectrometry System, and Method for Processing Mass...
A mass spectrometry data processing apparatus includes a data processing part and a calculation part. The calculation part calculates differences in mass among...
2019/0096645 Spectrometric Analysis
A method of spectrometric analysis comprises obtaining one or more sample spectra for a sample. The one or more sample spectra are subjected to pre-processing...
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